Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Direct-writing in self-developing resists using low-power, cw, ultraviolet light

Not Accessible

Your library or personal account may give you access

Abstract

"Direct-write" technologies for the laser processing of semiconductors use sharply focused laser beams to induce localized chemical reactions at semiconductor surfaces. Though these processes are slow compared with conventional optical printing, they are of scientific interest and they appear promising for applications involving the customizing, repairing, and testing of integrated circuits. There also has been interest in "self-developing" photoresists; these are materials that ablate during exposure to optical radiation. The use of a self-developing resist eliminates the need for a development step following exposure.

© 1985 Optical Society of America

PDF Article
More Like This
Direct writing of planar waveguide devices using ultraviolet light

Mikael Svalgaard and Martin Kristensen
BTuB.2 Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides (BGPP) 1997

Highly damage-resistant, broadband, hard AR coating for high-power lasers in the UV to near-IR wavelength regions

K. Yoshida, H. Yoshida, Y. Kato, and Chiyoe Yamanaka
WP2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985

Ablation of Organic Polymers by Ultraviolet and Visible Radiation: A Theoretical Approach

Barbara J. Garrison and R. Srinivasan
MB4 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1985

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.