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Studies of Laser Chemical Vapor Deposition Using Surface Sensitive Infrared Photoacoustic Spectroscopy

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Abstract

We report vibrational spectra of surface adsorbates during KrF laser assisted chemical vapor deposition (CVD) of Al films from trimethylaluminum (TMA) on single crystal sapphire substrates. The pulsed optoacoustic technique used has submonolayer sensitivity to O-H and C-H infrared active stretching vibrations and allows studies of the interactions between adsorbed H2O and TMA on surfaces prior to deposition. It also provides information about film composition during the early stages of laser stimulated growth. In addition, because surface Al-CH3 groups can be observed directly, the role of surface phase photochemistry in laser CVD can be investigated.

© 1985 Optical Society of America

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