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Conferences > MSBA > 1985 > WC > WC5

Mechanism of Trimethylaluminum Chemical Vapor Deposition Studied by Multiphoton Ionization Mass Spectrometric Detection

D.W. Squire, C.S. Dulcey, and M.C. Lin

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Abstract

Recent mechanistic studies of organometallic chemical vapor deposition (MOCVD) have suggested that organometallic cleavage and organic radical recombination take place on or above the heated substrate.1 We have employed the method of multiphoton ionization (MPI) in conjunction with conventional mass spectrometry to probe radical2 as well as stable products to elucidate the mechanisms of CVD processes.

© 1985 Optical Society of America

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