Modeling and experimental verification of high-numerical-aperture imaging in photoresist films

Donis G. Flagello; Tom Milster; Alan E. Rosenbluth

doi:10.1364/OAM.1993.MJJ.4

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MJJ.4
•https://doi.org/10.1364/OAM.1993.MJJ.4

Modeling and experimental verification of high-numerical-aperture imaging in photoresist films

Donis G. Flagello, Tom Milster, and Alan E. Rosenbluth

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Lithography to the Year 2000: 1 (MJJ)

Open Access

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D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Modeling and experimental verification of high-numerical-aperture imaging in photoresist films," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MJJ.4.

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Abstract

A vector diffraction analysis based on a plane-wave decomposition in the exit pupil, coupled with a modified thin-film matrix technique, is used to formulate a general model of high numerical aperture (NA > .5) image formation in thin films.

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