Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Moiré interferometric techniques for lithography and alignment

Open Access Open Access


Interferometric techniques provide simple and inexpensive tools for large area manufacturing of periodic nano-scale structures, using multiple exposures and phase shifting techniques either at the same level or multiple levels of photoresist, complex one and two-dimensional structures, and devices can be fabricated.

© 1993 Optical Society of America

PDF Article
More Like This
Moiré interferometric techniques for Si temperature measurements

Saleem H. Zaidi, Michael K. Lang, and S. R. J. Brueck
ThE.6 OSA Annual Meeting (FIO) 1993

Multiple exposure interferometric lithography

Saleem H. Zaidi and S. R. J. Brueck
TuI3 OSA Annual Meeting (FIO) 1992

Multiple exposure interferometric lithography—a novel approach to nanometer structures

Xiaolan Chen, Saleem H. Zaidi, and S. R. J. Brueck
CThJ5 Conference on Lasers and Electro-Optics (CLEO:S&I) 1996

Select as filters

Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.