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Conferences > OAM > 1993 > WPP > WPP.3

Emission spectroscopy during plasma-assisted deposition of thin films in relation to their optical properties

Karl H. Guenther, Xiaofeng Han, Shunning Qian, Shankar Raneru, Thomas C. Kimble, and Sohrab Zarrabian

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Abstract

We have been using emission spectroscopy for some time to investigate the plasma conditions (abundance of excited and ionized atoms and molecules) during reactive low voltage ion plating of refractory oxides.

© 1993 Optical Society of America

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