Abstract
This paper describes a GalnAsP /InP deep grating DBR for short cavity lasers. The reflectivity of the DBR fabricated mono-lithically by EB lithography and RIBE technique was evaluated to be 60%. By further reducing the roughness of etched sidewalls, pA-threshold lasing in 1.55 µm lasers will be obtained with cavity shorter than 20 µm.
© 1996 IEICE
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