Abstract

The reduction of optical losses is of crucial importance for enhancing the quality of thin film optics, especially when applications with high power lasers are considered. In order to improve the deposition process and the characterization methods a network of different laboratories was stated and one of the organized activity was the comparison of the results obtained by different available techniques for the measurement of the optical constants and optical losses. The reported data are related to oxide (SiO₂, Al₂O₃, Y₂O₃) and fluoride (MgF₂, LaF₃) films deposited on fused silica substrates by PVD techniques with and without ion assistance (IAD).

© 1995 Optical Society of America