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Conferences > OIC > 1995 > TuA > TuA4

Influence of Oxygen on Titanium Oxides Films by Ion Beam Sputter Deposition

Cheng-Chung Lee, Chan-Han Shen, and Jin-Cherng Hsu

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Abstract

Titanium oxides were deposited by ion beam sputtering using a Kaufman-type ion source1,2. A beam of argon ions bombarded on a pure titanium target (99.995%) at incident angle 48° from normal. Oxygen gas was fed near the substrate, and its pressure was measured by residual gas analyzer (RGA). The influence of oxygen on titanium oxides films were investigated. The thickness of films were measured by using Dektak surface profiler.

© 1995 Optical Society of America

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