Abstract

Research Electro-Optics, Inc. (REO) has provided alpha and beta sites to Particle Measuring Systems, Inc. (PMS) during their development of process chamber microcontamination sensors for the semiconductor industry. These real-time sensors are a desired replacement for monitor wafers currently widely in use and are equally suitable for optical thin-fílm process chamber applications. An early application of the use of silicon monitor wafers and a Surface Analysis System to study defect generation in optical thin films was described by Lalezari and Knollenberg (1989). Real-time sensors include both exhaust line sensors and in-chamber process environment sensors. An exhaust line sensor application on an IBS application was described by Knollenberg and Knollenberg (1992). The most recent cooperative effort has been with “in situ” fiber optics sensors. This work is ongoing, and some preliminary results are described here.

© 1995 Optical Society of America