Abstract

Narrow bandpass (notch) filters are very important elements in eliminating the noise in optoelectronic devices. In many applications, the notch filters should be able to stop the wavelength of interest very precisely. Also, their characteristics are expected to be intact against the environmental changes. Furthermore, the operation of sensitive electronics should not be disturbed by the presence of these filters. There are different types of notch filters. Among others, multilayer interference coatings are very promissing for many applications. In this paper, we describe the design and the selection of the materials for the notch filters. Also, we present an ECR (Electron Cyclotron Resonance) ion beam enhanced deposition system which we have developed for the fabrication of notch filters.

© 1995 Optical Society of America