Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications

Aiko Ode

doi:10.1364/OIC.2013.FC.8

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper FC.8
•https://doi.org/10.1364/OIC.2013.FC.8

Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications

Aiko Ode

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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A. Ode, "Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper FC.8.

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Abstract

Ion beam sputtering of AlF₃, LaF₃, and GdF₃ as single layers, AR and HR coatings for 193nm is presented. The low deposition temperature allows for both CaF₂ and fused silica substrates to be used.

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