Low roughness surface of the aspheric fused silica substrate in the EUV by ion beam figuring

Weichen Gu; Weichen Gu; Pengfeng Sheng; Pengfeng Sheng; Jiali Wu; Jiali Wu; Runze Qi; Runze Qi; Jun Yu; Jun Yu

doi:10.1364/OIC.2022.ME.4

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper ME.4
•https://doi.org/10.1364/OIC.2022.ME.4

Low roughness surface of the aspheric fused silica substrate in the EUV by ion beam figuring

Weichen Gu, Pengfeng Sheng, Jiali Wu, Runze Qi, and Jun Yu

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

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W. Gu, P. Sheng, J. Wu, R. Qi, and J. Yu, "Low roughness surface of the aspheric fused silica substrate in the EUV by ion beam figuring," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper ME.4.

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Abstract

In order to provide a high-quality substrate for coating, through ion beam processing, the surface shape of the substrate surface meets the requirements, and the roughness is optimized.

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