Abstract
We developed a novel sputter process for deposition of amorphous layers from TiO2 with low defects levels for precision optics and photonics applications. The layer properties were investigated by XSEM, GIXRD, and particle measurements.
© 2022 The Author(s)
PDF Article | Presentation VideoMore Like This
Taisei Wakamiya, Hiroshi Murotani, and Takayuki Matsudaira
ThA.10 Optical Interference Coatings (OIC) 2022
S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, and H. Hedge
R44 Extreme Ultraviolet Lithography (EUL) 1996
Jincheng Qian, Oleg Zabeida, Alberto Argoitia, Robert Sargent, Jolanta Klemberg-Sapieha, and Ludvik Martinu
FB.10 Optical Interference Coatings (OIC) 2022