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Layered Optics for Nuclear Monochromatization of Synchrotron Radiation

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Abstract

The insertion device based third generation synchrotron radiation sources currently under construction in Europe, USA, and Japan brings new opportunities and challenges in the design and manufacturing of x-ray optics. These high brightness sources demand more stringent parameters on the quality of multilayered optics in terms of size, uniformity, and surface and interface roughness.

© 1992 Optical Society of America

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