Atomic Layer Growth of Tungsten and Boron for Multilayer X-ray Optics

J.K. Shurtleff; D.D. Allred; R.T. Perkins; L.V. Knight; J.M. Thorne; J.D. Phillips

doi:10.1364/SXRAY.1992.PD4

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1992),
paper PD4
•https://doi.org/10.1364/SXRAY.1992.PD4

Atomic Layer Growth of Tungsten and Boron for Multilayer X-ray Optics

J.K. Shurtleff, D.D. Allred, R.T. Perkins, L.V. Knight, J.M. Thorne, and J.D. Phillips

Soft X-Ray Projection Lithography 1992

Monterey, California United States
6–8 April 1992
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J. K. Shurtleff, D. D. Allred, R. T. Perkins, L. V. Knight, J. M. Thorne, and J. D. Phillips, "Atomic Layer Growth of Tungsten and Boron for Multilayer X-ray Optics," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1992), paper PD4.

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Abstract

We are investigating atomic layer growth which can produce crystalline superlattices or amorphous multilayers with smaller periods and better uniformity than currently available.

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