Abstract
Stable fundamental mode operation in semiconductor injection lasers to high power levels can be accomplished by introducing structures with lateral index guiding. These structures, usually, consist of two-step growths with a blocking layer and their processing steps are complicated, In this paper, we report on a real index-guided stripe laser structure which can be achieved by a one-step selective area growth technique in the metalorganic chemical vapor deposition (MOCVD) system.
© 1987 Optical Society of America
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