Abstract
Spatial uniformity of the multilayer coatings deposited onto figured optics for soft x-ray projection lithography optical systems must be accurately controlled in order to maintain high throughput, and to preserve the imaging quality of the substrate. Controlling the uniformity with the desired accuracy can be quite challenging however, due to the nature of the deposition process.
© 1991 Optical Society of America
PDF ArticleMore Like This
H. E. Bennett and D. K. Burge
WA4 Optical Fabrication and Testing (OF&T) 1981
D. G. Stearns
WC2 Soft X-Ray Projection Lithography (SXRAY) 1991
D. G. Stearns
WC2 Short Wavelength Coherent Radiation: Generation and Applications (HFSW) 1991