Tungsten/Carbon Multilayers Prepared By Ion Beam Sputtering

Katsuhiko Murakami; Hiroshi Nakamura; Tetsuya Oshino; Hideo Nikaido

doi:10.1364/SXRAY.1991.ThB4

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1991),
paper ThB4
•https://doi.org/10.1364/SXRAY.1991.ThB4

Tungsten/Carbon Multilayers Prepared By Ion Beam Sputtering

Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, and Hideo Nikaido

Soft X-Ray Projection Lithography 1991

Monterey, California United States
10–12 April 1991
ISBN:

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Multilayer Optics II (ThB)

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K. Murakami, H. Nakamura, T. Oshino, and H. Nikaido, "Tungsten/Carbon Multilayers Prepared By Ion Beam Sputtering," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1991), paper ThB4.

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Abstract

W/C multilayers, well known as good X-ray reflecting mirrors, were prepared by ion beam sputtering. The properties of the multilayers were investigated by low-angle X-ray diffraction, transmission electron microscopy (TEM) observation of the cross section and Auger electron spectroscopy.

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