Abstract

Surface-imaging lithography is a technique which was first described by Taylor et al. nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness. Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography.² The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach.

© 1991 Optical Society of America