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Conferences > SXRAY > 1991 > ThD > ThD1

Resist Characterization and Lithography Simulation

A.R. Neureuther and W.G. Oldham

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Abstract

The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.

© 1991 Optical Society of America

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