Contamination Studies of XUV Reflecting Surfaces for Projection Lithography*

Brian E. Newnam; Marion L. Scott

doi:10.1364/SXRAY.1992.PD3

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1992),
paper PD3
•https://doi.org/10.1364/SXRAY.1992.PD3

Contamination Studies of XUV Reflecting Surfaces for Projection Lithography^*

Brian E. Newnam and Marion L. Scott

Soft X-Ray Projection Lithography 1992

Monterey, California United States
6–8 April 1992
ISBN:

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B. E. Newnam and M. L. Scott, "Contamination Studies of XUV Reflecting Surfaces for Projection Lithography*," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1992), paper PD3.

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Abstract

The results of carbon and oxide contamination experiments with Al, Si, Rh, and Ag films and surfaces quantify certain film growth rates and parameter dependences.

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