Abstract

The reflectivity and scattering of mirrors used for x-ray optics at a wavelength of 13.6 nm depend on spatial wavelengths of the surface topography ranging from atomic dimensions to the full aperture of the mirror. Accordingly, we are developing measurement and calibration approaches that will span over 8 orders of magnitude of spatial wavelength from 1 nm to 150 mm. As shown in Fig. 1, the array of profiling techniques in our laboratory includes scanning tunneling microscopy, atomic force microscopy, stylus profiling, and phase measuring interferometry for both finish and figure. In addition, a calibrated stylus instrument produces measurements of surface finish profile with good resolution and accuracy. Thus, NIST is developing the capability to provide continuous power spectral information over the full bandwidth. The overlapping spatial wavelength regimes of the various approaches enable us to test any methods divergence between them.

© 1993 Optical Society of America