Abstract

Laser generated extreme ultraviolet sources applicable to soft x-ray projection lithography (SXPL) are undermined by target debris formation. This debris, in the form of vapor and condensed ejecta, can coat and damage the optical systems that direct and focus the emitted radiation for the lithographic application [1]. The purpose of this paper is to present ongoing work to develop a computational methodology for understanding and predicting the debris formation process in these laser sources.

© 1993 Optical Society of America