Image Simulation for Soft-X-ray Projection Printing

Derek C. Lee; Andrew R. Neureuther

doi:10.1364/SXRAY.1993.TuD.11

Soft X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1993),
paper TuD.11
•https://doi.org/10.1364/SXRAY.1993.TuD.11

Image Simulation for Soft-X-ray Projection Printing

Derek C. Lee and Andrew R. Neureuther

Soft X-Ray Projection Lithography 1993

California United States
10–12 May 1993
ISBN:

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Poster Session I (TuD)

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D. C. Lee and A. R. Neureuther, "Image Simulation for Soft-X-ray Projection Printing," in Soft X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1993), paper TuD.11.

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Abstract

SPLAT has been useful in exploring the deviations of optimal image quality from that of limits of diffraction limited optics in projection x-ray lithography proto-type systems. This was accomplished through modifying the aberration options in SPLAT to accept detailed optical system wavefront data from CodeV. This allows feedback from the as built and as coated soft x-ray elements on the resulting imaged quality.

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