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Enhanced performance of KrF laser-induced x-ray sources and multilayer mirrors for soft x-ray projection lithography

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Abstract

The rapid development of high average power excimer lasers pushes the potential of a laser plasma x-ray source for SXPL. Now that the problem of debris production is solved at least at the prototype level [1] the source might be a candidate for operation in an industrial environment. The development of high reflectivity multilayer coatings for soft x-rays at normal incidence makes it possible to produce a demagnifying x-ray optical system. Together with an x-ray reflection mask all ingredients to develop a SXPL system are present. A cooperation of research institutes, semiconductor industry, resist and laser manufacturers has been set up to develop the process technology required.

© 1993 Optical Society of America

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