Abstract

Recent developments of x-ray multilayers have focused on understanding and controlling the roughness at the interfaces to achieve high reflectance at wavelengths below 10 nm. The structure at the interfaces in generaldepends on the microstructures inside the layers, and on the interactions between the layer materials in multilayers. Studies of the microstructure-interfacial roughness relationship, and their effects on the reflectance performance are hence important in design of the multilayers.

© 1993 Optical Society of America