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Rotating Target Source: Novel Shaperless Concept for Magnetron Sputtering with Excellent Uniformity

M. Chesaux, S. Schwyn Thöny, S. Gees, and A. Frigg

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Abstract

In this novel approach the distribution of the sputtered flux is tailored by careful adjustment of the shape of the race track and of the magnetic field intensity. Target usage is improved by rotating the disk shaped target. Uniformities <±0.25% over 200 mm wafer with 6 mm edge exclusion can be reached.

© 2016 Optical Society of America

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