Abstract

Smooth, clear nanocrystalline diamond films have been grown on Si substrates to a thickness between 0.7 and 3.0 microns, and were subsequently etched into membrane structures for use as proximity mask membranes in x-ray lithography, x-ray window, and optical pellicle beamsplitter applications. The diamond deposition was by microwave plasma enhanced, chemical vapor deposition using a cyclic renucleation process. The gas mixtures of hydrogen, methane, nitrogen and oxygen were cyclically altered to control grain size and quality. Nanocrystalline grain sizes were achieved without significant introduction of amorphous carbon into the material as determined by micro-Raman analysis.

© 1995 Optical Society of America