Abstract

Effect of plasma flow above a substrate on the growth of diamond has been investigated using a rotating substrate assisted arc discharge plasma jet chemical vapor deposition (CVD). Flow field of a plasma jet has been numerically simulated and variations of velocity above a substrate has been predicted when a substrate is rotated. Morphology and quality of diamonds synthesized under various rotational speeds have been observed using a scanning electron microscope and by Raman spectroscopy, and mass growth rate has been measured

© 1995 Optical Society of America