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Fabrication of MOS devices with extreme ultraviolet lithography

A208 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Mass-producible microtags

A212 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Post-polish figuring of optical surfaces using multilayer deposition

DFO144 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Improving the Figure of Very Good Mirrors by Deposition

DFO149 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase correcting layers in EUV imaging systems for microlithography

DFO152 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Preliminary investigation of an additive approach to the fabrication of precision aspheres

DFO156 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm

EIE186 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Extreme Ultraviolet 1:1 Ring-Field Lithography Machine

EIE192 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Image Degradation from Surface Scatter in EUV Optics

EIE199 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Measuring the Effect of Scatter on the Performance of a Lithography System

EIE203 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Debris-free EUVL sources based on gas jets

ES66 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

High-repetition-rate droplet target for laser-plasma EUV generation

ES72 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Characterization of mass-limited ice droplet laser plasmas

ES75 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Feasibility of Various Discharge Configurations for High Intensity Lithium Vapor Discharge Source at 13.5 nm for EUVL

ES80 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Progress on an X-ray laser source at 135 A

ES84 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

An Advanced EUV source from water droplet laser plasma

ES89 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Progress in the Development of EUV Imaging Systems

EWW2 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Optical Technology for EUV Lithography

EWW9 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Development of Extreme Ultraviolet Lithography along the European route

EWW13 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Basic Technologies for Extreme Ultraviolet Lithography

EWW16 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Lithography for Manufacturing Integrated Circuits Beyond 180 nm

LM22 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Specifications and Metrology of Surface Figure and Finish for Microlithography Optics

OF94 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Aspheric Surface Generation Requirements for Magnetorheological Finishing

OF98 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Surface characterization of optics for EUV lithography

OF103 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics

OM108 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Far-field Radiation From a Cleaved Cylindrical Dielectric Waveguide

OM113 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase-Shifting Point Diffraction Interferometry for At-Wavelength Testing of Lithographic Optics

OM118 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Initial Experiments on Direct Aerial Image Measurements in the Extreme Ultraviolet

OM124 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Development of extreme ultraviolet interferometry for laser plasma source operation

OM128 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

A 3-D Numerical Study of Pinhole Diffraction to Predict the Accuracy of EUV Point Diffraction Interferometry

OM133 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Zonal Placement Errors in Zone Plate Lenses

OM138 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Ring-Field EUVL Camera with Large Etendu

OSD178 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Projection Lithography with Ail-Reflecting Optics

OSD181 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Surface Imaging Resists: Promises, Practices and Prospects

R28 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Basic Issues Associated With Four Potential EUV Resist Schemes: Trilayer Organometallic Bilayer, or Plasma Deposited-Plasma & Developed Bilayer, and Silylated Resists

R33 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Characterization of SAL605 Negative Resist at λ=13 nm

R39 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reticle blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers

R44 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

At-wavelength inspection of EUVL mask defects with a 1X Offner ring-field system

R49 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

EUVL Reticle Factory Model and Reticle Cost Analysis

R54 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reflecting Multilayer Coatings for EUV Projection Lithography

RMC162 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Nonspecular Scattering in EUV Lithography: Determining Specifications for Surface Finish

RMC167 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers

RMC169 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reflectance coatings for the vacuum/extreme ultraviolet region

RMC173 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF