Fabrication of MOS devices with extreme ultraviolet lithography

K. B. Nguyen, G. F. Cardinale, D. A. Tichenor, G. D. Kubiak, K. Berger, A. K. Ray-Chaudhuri, Y. Perras, S. J. Haney, R. Nissen, K. Krenz, R. H. Stulen, H. Fujioka, C. Hu, J. Bokor, D. M. Tennant, and L. A. Fetter

A208 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Mass-producible microtags

William C. Sweatt, Michael R. Descou, Avijit K. Ray-Chaudhuri, Kevin D. Krenz, Daniel A. Tichenor, Richard H. Stulen, Mial E. Warren, and Stan H. Kravitz

A212 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Post-polish figuring of optical surfaces using multilayer deposition

C. Tarrio, E. Spiller, C. J. Evans, T. B. Lucatorto, and C. W. Clark

DFO144 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Improving the Figure of Very Good Mirrors by Deposition

W. C. Sweatt, J. W. Weed, A. V. Farnsworth, M. E. Warren, C. C. Neumann, R. S. Goeke, and R. N. Shagam

DFO149 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase correcting layers in EUV imaging systems for microlithography

Joseph Braat

DFO152 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Preliminary investigation of an additive approach to the fabrication of precision aspheres

F.W. Weber, C. Montcalm, S.P. Vernon, and D. R. Kania

DFO156 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm

B. La Fontaine, D. P. Gaines, D. R. Kania, G. E. Sommargren, S. L. Baker, and D. Ciarlo

EIE186 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Extreme Ultraviolet 1:1 Ring-Field Lithography Machine

A.A. MacDowell, Z. Shen, K. Fujii, J.E. Bjorkholm, R.R. Freeman, L. Fetter, D.W. Taylor, D.M. Tennant, L. Eichner, W.K. Waskiewicz, D.L. White, D.L. Windt, O.R. Wood, S. Haney, and T. Jewell

EIE192 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Image Degradation from Surface Scatter in EUV Optics

D. P. Gaines, T.P. Daly, D.G. Stearns, B. LaFontaine, D.W. Sweeney, H.C. Chapman, and D. Fuchs

EIE199 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Measuring the Effect of Scatter on the Performance of a Lithography System

B. La Fontaine, T. P. Daly, H. N. Chapman, D. P. Gaines, D. G. Stearns, D. W. Sweeney, and D. R. Kania

EIE203 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Debris-free EUVL sources based on gas jets

Glenn D. Kubiak, Luis J. Bernardez, Kevin D. Krenz, Donna J. O’Connell, Robert Gutowski, and Alan M. M. Todd

ES66 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

High-repetition-rate droplet target for laser-plasma EUV generation

Lars Malmqvist, Lars Rymell, and Hans M. Hertz

ES72 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Characterization of mass-limited ice droplet laser plasmas

D. Torres, F. Jin, M. Richardson, and C. DePriest

ES75 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Feasibility of Various Discharge Configurations for High Intensity Lithium Vapor Discharge Source at 13.5 nm for EUVL

M.A. Klosner and W.T. Silfvast

ES80 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Progress on an X-ray laser source at 135 A

Malcolm McGeoch

ES84 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

An Advanced EUV source from water droplet laser plasma

F. Jin, M. Richardson, G. Shimkaveg, and D. Torres

ES89 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Progress in the Development of EUV Imaging Systems

D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, R. N. Shagam, W. C. Sweatt, T. G. Smith, O. R. Wood, A. A. MacDowell, J. E. Bjorkholm, T. E. Jewell, F. Zernike, B. L. Fix, and H. W. Hauschildt

EWW2 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Optical Technology for EUV Lithography

Masaaki Ito, Souichi Katagiri, Hiromasa Yamanashi, Eiichi Seya, Taro Ogawa, Hiroaki Oizumi, and Tsuneo Terasawa

EWW9 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Development of Extreme Ultraviolet Lithography along the European route

F. Bijkerk

EWW13 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Basic Technologies for Extreme Ultraviolet Lithography

Katsuhiko Murakami, Tetsuya Oshino, Sumito Shimizu, Wakana Wasa, Hiroyuki Kondo, Masayuki Ohtani, Noriaki Kandaka, Kiyoto Mashima, and Kazushi Nomura

EWW16 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Lithography for Manufacturing Integrated Circuits Beyond 180 nm

R. E. Gleason

LM22 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Specifications and Metrology of Surface Figure and Finish for Microlithography Optics

F. Zernike

OF94 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Aspheric Surface Generation Requirements for Magnetorheological Finishing

Don Golini, Steve Jacobs, Yiyang Zhou, Ed Fess, and Mark Atwood

OF98 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Surface characterization of optics for EUV lithography

D. P. Gaines, D.W. Sweeney, K.W. DeLong, S.P. Vernon, S.L. Baker, D. A. Tichenor, and R. Kestner

OF103 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics

Gary E. Sommargren

OM108 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Far-field Radiation From a Cleaved Cylindrical Dielectric Waveguide

C. Cerjan

OM113 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Phase-Shifting Point Diffraction Interferometry for At-Wavelength Testing of Lithographic Optics

E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood

OM118 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Initial Experiments on Direct Aerial Image Measurements in the Extreme Ultraviolet

C.H. Fields, W.G. Oldham, A. K. Ray-Chaudhuri, K. D. Krenz, and R. H. Stulen

OM124 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Development of extreme ultraviolet interferometry for laser plasma source operation

A. K. Ray-Chaudhuri, K. D. Krenz, R.P. Nissen, S.J. Haney, C.H. Fields, W. C. Sweatt, and A.A. MacDowell

OM128 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

A 3-D Numerical Study of Pinhole Diffraction to Predict the Accuracy of EUV Point Diffraction Interferometry

K. A. Goldberg, E. Tejnil, and J. Bokor

OM133 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Zonal Placement Errors in Zone Plate Lenses

E. Tejnil, K. A. Goldberg, E. H. Anderson, and J. Bokor

OM138 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Ring-Field EUVL Camera with Large Etendu

W. C. Sweatt

OSD178 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Projection Lithography with Ail-Reflecting Optics

O.R. Wood, J. E. Bjorkholm, A.A. MacDowell, S. Vaidya, and D.R. Shafer

OSD181 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Surface Imaging Resists: Promises, Practices and Prospects

Maureen Hanratty

R28 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Basic Issues Associated With Four Potential EUV Resist Schemes: Trilayer Organometallic Bilayer, or Plasma Deposited-Plasma & Developed Bilayer, and Silylated Resists

David R. Wheeler, Glenn Kubiak, Avijit Ray-Chaudhuri, and Craig Henderson

R33 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Characterization of SAL605 Negative Resist at λ=13 nm

Bruno La Fontaine, D. Ciarlo, D. P. Gaines, and D. R. Kania

R39 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reticle blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers

S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, and H. Hedge

R44 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

At-wavelength inspection of EUVL mask defects with a 1X Offner ring-field system

K. B. Nguyen, A. MacDowell, K. Fujii, D. M. Tennant, and L. A. Fetter

R49 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

EUVL Reticle Factory Model and Reticle Cost Analysis

Andrew M. Hawryluk, Gilbert Shelden, and Patrick Troccolo

R54 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reflecting Multilayer Coatings for EUV Projection Lithography

James H. Underwood

RMC162 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Nonspecular Scattering in EUV Lithography: Determining Specifications for Surface Finish

D. G. Stearns, D. P. Gaines, B. LaFontaine, G. E. Sommargren, D. W. Sweeney, D. R. Kania, and N. M. Ceglio

RMC167 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers

Hisataka Takenaka, Tomoaki Kawamura, and Tsuneyuki Haga

RMC169 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF

Reflectance coatings for the vacuum/extreme ultraviolet region

N. J. Duddles

RMC173 Extreme Ultraviolet Lithography (EUL) 1996 View: PDF