Misalignment modes in off-axis lithography projection cameras

Michael R. Descour; Bridget Ford

doi:10.1364/IODC.1998.LThD.3

International Optical Design Conference
Technical Digest Series (Optica Publishing Group, 1998),
paper LThD.3
•https://doi.org/10.1364/IODC.1998.LThD.3

Misalignment modes in off-axis lithography projection cameras

Michael R. Descour and Bridget Ford

International Optical Design Conference 1998

Kailua-Kona, Hawaii United States
8–12 June 1998
ISBN:

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Lithography 2 (LThD)

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M. R. Descour and B. Ford, "Misalignment modes in off-axis lithography projection cameras," in International Optical Design Conference, Technical Digest Series (Optica Publishing Group, 1998), paper LThD.3.

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Abstract

The performance specifications associated with EUV lithography tools are among the most demanding for any optical system. Metrology techniques and alignment strategies define an alignment protocol: what type of metrology data needs to be collected and how is it analyzed to achieve or recapture required optical image quality.

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