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Conferences > ODP > 1993 > PD > PD.1

Optical Design Issues for Soft-X-Ray Projection Lithography

W.C. Sweatt, D.A. Tichenor, G.D. Kubiak, W.W. Chow, P.D. Rockett, R.E. Olson, T.E. Jewell, O.R. Wood, D.L. Windt, J.E. Bjorkholm, M.D. Himel, and A.A. MacDowell

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Abstract

A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.

© 1993 Optical Society of America

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