Abstract
A novel arsenic-free thermal cleaning method combined with gas-source molecular- beam-epitaxy (GS-MBE) is proposed for reducing dislocations and organic impurities accumulated at GaAs regrown interface. By using this method, 0.98 µm InGaAs/InGaP DFB laser was successfully fabricated for the first time by GS-MBE.
© 1996 IEICE
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