Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OECC > 1996 > 18P > 18P.1
  • First Optoelectronics and Communications Conference
  • Technical Digest Series (Optica Publishing Group, 1996),
  • paper 18P.1

Precise Control of Vertical Surface Selective Deposition (VSSD) of Dielectric Films by Dual Ion-Beam Sputtering Technique

Sumaru Niida, Takahiko Tohyama, Toshihiro Baba, and Yasuo Kokubun

Not Accessible

Your library or personal account may give you access

Abstract

To impove the accuracy of film thickness deposited selectively on the vertical surface of substrate, the deposition rates of SiO2 and Si of the VSSD method were measured, and a precise control was achieved. This method was applied to the monolithic formation of high reflectance mirror on an LD, and it was confirmed that the VSSD process did not degradate the laser characteristics.

© 1996 IEICE

PDF Article
More Like This
Reticle blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers

S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, and H. Hedge
R44 Extreme Ultraviolet Lithography (EUL) 1996

Thickness distribution of thin films deposited by ion beam sputtering

Cheng-Chung Lee, Kie-Pin Chuang, and Jean-Yee Wu
MB4 Optical Interference Coatings (OIC) 2001

Laser damage resistance of HfO2 thin films deposited by Electron Beam Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

L. Gallais, J. Capoulade, J.Y. Natoli, M. Commandré, M. Cathelinaud, C. Koc, and M. Lequime
FB3 Optical Interference Coatings (OIC) 2007

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use