Abstract

Ellipsometry is widely used for measurement of thin films. Usually instruments can only give index of refraction and thickness of one transparent layer at one wavelength. In order to know more about the layer two techniques have been developed recently; one is exploration of the spectral information covering the useful range from .23 up to 1.7μm. The multiplicity of information all along the spectrum enables smart calculations using various models to explain a posteriori the history of the layer growth. The other way is to follow the etching of the surface and the growing of a film in Situ, in real time. For this purpose only a well chosen wavelength has been used, occasionally two or three wavelengths are studied at the same time.

© 1988 Optical Society of America