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Conferences > OIC > 1998 > MB > MB.4

Narrow-Band Notch Filters produced by Plasma Impulse Chemical Vapour Deposition

R P Netterfield and Ian Llewellyn

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Abstract

There have been several publications in recent years on the use of Plasma Impulse Chemical Vapour Deposition (PICVD) as a means of depositing optical multilayer coatings under computer control [1-4]. We report on the use of the technique in the deposition of notch filters consisting of up to 200 alternating layers of SiO2 and SiOxNy.

© 1998 Optical Society of America

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