Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography

Jonathan Pomfret; Jonathan Pomfret; Sijia Cai; Daxing Han; Des Gibson; Des Gibson; Shigeng Song; Shigeng Song; David Hutson; David Hutson; Peter Mackay

doi:10.1364/OIC.2022.MD.8

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper MD.8
•https://doi.org/10.1364/OIC.2022.MD.8

Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography

Jonathan Pomfret, Sijia Cai, Daxing Han, Des Gibson, Shigeng Song, David Hutson, and Peter Mackay

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

From the session
Small: Metamaterials, Nanostructures, Patterned Filters (MD)

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J. Pomfret, S. Cai, D. Han, D. Gibson, S. Song, D. Hutson, and P. Mackay, "Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper MD.8.

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Abstract

A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

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