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Conferences > SXRAY > 1991 > ThC > ThC3

XUV Conversion Efficiency in a Low Intensity Krf Laser-Plasma for Projection Lithography

Paul D. Rockett, John A. Hunter, Glenn D. Kubiak, and Kurt W. Berger

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Abstract

The efficiency of XUV production from a laser-plasma directly relates to the cost of fielding such a source for projection x-ray lithography (PXRL). Measurements of the radiated conversion efficiency were made on the Sandia National Laboratories Laser Plasma Source (LPS), a bright reliable point x-ray source. The LPS was designed for use as a prototype XUV source for PXRL, and included a Lambda Physik KrF laser focussed weakly onto a rotating target drum. The laser produced 1.1J pulses at 248nm in 27ns and could be operated up to 100Hz. Focal intensities on target were in the low 1010 W/cm2 using a 1m focal length simple lens.

© 1991 Optical Society of America

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