Abstract

A recent feasibility study on X-ray projection lithography (XRPL) has demonstrated an extremely high resolution reaching 0.1 µ m¹). For practical manufacturing of integrated circuits, however, a high throughput is also necessary. Although the throughput of an XRPL system was already estimated at a wavelength of 4.5nm²⁾, this system is difficult to build owing to low performance of actual multilayers. We discuss the throughput of an XRPL system using 13nm radiation for which good quality multilayers can be fabricated³⁾.

© 1991 Optical Society of America