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Recent analyses of critical system issues in Soft X-ray Projection Lithography are discussed. An overall system design provides detailed requirements (specifications) for x-ray mirror reflectivity, source power and parameters, resist sensitivity, etc. A cost analysis for SXPL systems leads to important requirements for x-ray mirror technology. An analysis of power loading limitations on precision SXPL imaging optics has important implications for source power and x-ray mirror reflectivity requirements.
© 1991 Optical Society of America
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