Abstract

Soft X-ray projection lithography (SXPL) may be used to fabricate high resolution structures for future integrated circuit devices but will require an al1-reflecting optical system with < 100 nm resolution and < 10 nm image distortion over large fields-of-view. In conventional designs, the lithographic, tool for SXPL is envisioned as a "ring-field" scanning system with multiple (3-5), possibly aspheric, imaging optics fabricated to ^~<1 nm figure precisian. Conventional system designs will use a reflection mask.

© 1991 Optical Society of America