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Conferences > SXRAY > 1993 > MA > MA.3

Two Aspheric Mirror System Design Development for Soft-X-Ray Projection Lithography

T. E. Jewell

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Abstract

Two-mirror reduction system design for soft-x-ray projection lithography application has been described[1,2]. 5X reduction two-aspheric-mirror design reported earlier[2] has small back clearance distance, which makes it difficult to build. In order to find an optimum design solution, which can provide the maximum back clearance distance at the minimum system length, the system magnification should be included in the design process as one of the variable parameters.

© 1993 Optical Society of America

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