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Conferences > SXRAY > 1993 > MA > MA.7

Study of Defects in Multilayer Reflective Coatings for Soft X-ray Projection Lithography Mask

Khanh B. Nguyen, Tai D. Nguyen, Alfred K. Wong, Andrew R. Neureuther, and David T. Attwood

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Abstract

In a soft x-ray/EUV projection lithography system, multilayer reflective coatings consisting of 30-50 bilayers of alternating high-Z/1ow-Z materials would be used on all reflecting surfaces - collection optics, masks, and imaging optics. A reflection mask would likely be a multilayer coating with a top layer of patterned absorber [1, 2]. Since the mask is to be faithfully reproduced on the wafer, any mask defects and imperfections would also be reproduced.

© 1993 Optical Society of America

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