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Conferences > SXRAY > 1993 > MB > MB.3

X-ray characterization of a three-element condenser system for soft x-ray projection lithography

D.P. Gaines, G.L. Sommargren, and S.P. Vernon

Open Access Open Access

Abstract

A three-element condenser system has been designed and fabricated for use in a soft x-ray projection lithography facility at Lawrence Livermore National Laboratory. The design uses Kohler illumination to transport x-rays generated by a laser-produced plasma onto an x-ray reflection mask. The condenser optics are coated with molybdenum silicon multilayers to provide peak reflectance at an operating wavelength of approximately 13.0 nm.

© 1993 Optical Society of America

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