Abstract

This paper explores the projected cost of ownership for a soft x-ray projection lithography process. The analysis includes the cost of capital equipment (exposure tool and resist processing), resist materials, and masks, as well as the economics associated with tool productivity and utilization. There is a particular focus on the impact of the cost of the masks, as it applies to different IC product types and their volumes. Also studied are the tradeoff of system throughput with required resist dose and the costs associated with multilayer resist systems.

© 1993 Optical Society of America