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Soft-x-ray projection lithography using two arrays of phase zone plates

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Abstract

At feature sizes below 70nm, the mask-to-sample gap in proximity x-ray lithography must be less than 5μm, which, although this is not a problem in research, it may be undesirable in manufacturing. Thus, for sub-70nm features, one is persuaded to consider the feasibility of x-ray projection systems.

© 1993 Optical Society of America

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