Ring-Field EUVL Camera with Large Etendu

W. C. Sweatt

doi:10.1364/EUL.1996.OSD178

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper OSD178
•https://doi.org/10.1364/EUL.1996.OSD178

Ring-Field EUVL Camera with Large Etendu

W. C. Sweatt

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
ISBN:

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Optical System Designs (OSD)

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W. C. Sweatt, "Ring-Field EUVL Camera with Large Etendu," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper OSD178.

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Abstract

These scanning cameras with large instantaneous fields make efficient use of the new, 300-μm diameter, debris-less laser-plasma sources while printing 100-nm features.

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