Projection Lithography with Ail-Reflecting Optics

O.R. Wood; J. E. Bjorkholm; A.A. MacDowell; S. Vaidya; D.R. Shafer

doi:10.1364/EUL.1996.OSD181

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper OSD181
•https://doi.org/10.1364/EUL.1996.OSD181

Projection Lithography with Ail-Reflecting Optics

O.R. Wood, J. E. Bjorkholm, A.A. MacDowell, S. Vaidya, and D.R. Shafer

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
ISBN:

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Optical System Designs (OSD)

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O. R. Wood, J. E. Bjorkholm, A. A. MacDowell, S. Vaidya, and D. R. Shafer, "Projection Lithography with Ail-Reflecting Optics," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper OSD181.

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Abstract

Recent efforts to design a high-numerical aperture (NA), all-reflecting, vacuum-ultraviolet (VUV) imaging system for projection lithography are described.

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