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Planar Buried Heterostructure InP/GaInAs Lasers Grown Entirely by OMVPE with Semi-insulating Blocking Layers

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Abstract

Planar Buried-Heterostructure (PBH) lasers offer many advantages such as low threshold and ease of integration and have been used extensively in the 1.3–1.65 μm range for optical communications1,2. In most of this work the laser structure was grown by LPE including both the basic DH structure and the regrown p-n blocking layer. More recently many investigators have used various hybrid LPE-vapor phase techniques3-7 to grow these structures in order to increase planarity or yield. The desire to achieve these goals coupled with the difficulties associated with two step LPE growth would make g OMVPE a natural choice as a method of growth for the PBH structure and, in fact Nelson et al8 has reported an "all"-OMVPE grown PBH laser operating at 1.52 μm.

© 1986 Optical Society of America

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